Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Mitsuishi, K. Furuya

研究成果: Article査読

21 被引用数 (Scopus)

抄録

We have fabricated arrays of nanorods of cubic iron silicide from iron pentacarbonyl gas source on Si(111) substrates by electron-beam-induced deposition at elevated temperature in an ultrahigh-vacuum transmission electron microscope. The nanorods are aligned along one of the Si 〈110〉 directions. Their length could be controlled by changing the irradiation time. It was revealed that the vicinity of the substrate surface influences the growth direction and location of the nanorods.

本文言語English
論文番号183104
ページ(範囲)1-3
ページ数3
ジャーナルApplied Physics Letters
86
18
DOI
出版ステータスPublished - 2005 5 2
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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