Post-deposition processes for nanostructures formed by electron beam induced deposition with Pt(PF3)4 precursor

M. Takeguchi, M. Shimojo, K. Furuya

研究成果: Article査読

15 被引用数 (Scopus)

抄録

Electron beam induced deposition was performed using a Pt(PF 3)4 precursor gas. Self-standing nanowires were produced on the edge of a molybdenum film, followed by two post-deposition processes; electron beam irradiation at room temperature and heating at about 400 K in vacuum. The as-deposited nanowires were composed of an amorphous phase, of which the dominant composition was platinum but containing a small amount of phosphorus impurity. After irradiating with a 300 keV electron beam, the amorphous nanowires were transformed to crystalline ones. By heating, the as-deposited nanowires became single-crystal platinum with a large grain size and the phosphorus content disappeared.

本文言語English
論文番号439
ページ(範囲)439-442
ページ数4
ジャーナルApplied Physics A: Materials Science and Processing
93
2
DOI
出版ステータスPublished - 2008 11
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 材料科学(全般)

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