Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation

Tomoji Ohishi, S. Sone, K Yanagida

研究成果: Article

元の言語English
ページ(範囲)105-111
ページ数7
ジャーナルScientific Reports
5
出版物ステータスPublished - 2014

これを引用

@article{a5c3771a294d46b1bf9d0f481f9ad90e,
title = "Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation",
author = "Tomoji Ohishi and S. Sone and K Yanagida",
year = "2014",
language = "English",
volume = "5",
pages = "105--111",
journal = "Scientific Reports",
issn = "2045-2322",
publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation

AU - Ohishi, Tomoji

AU - Sone, S.

AU - Yanagida, K

PY - 2014

Y1 - 2014

M3 - Article

VL - 5

SP - 105

EP - 111

JO - Scientific Reports

JF - Scientific Reports

SN - 2045-2322

ER -