Preparation and properties of anti-reflection/anti-static thin films formed on organic film by photo-assisted sol-gel method

研究成果: Article

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With the objective of developing films for advanced systems, a photo-assisted sol-gel method has been used to form an anti-reflection/anti-static thin film on an organic film (PET) that has no heat-resistance, and the properties of the film have been evaluated. This method makes it possible to form a layered ITO/SiO2 structure on the film at 60 °C, which is a good condition for such film formation. This film has a surface resistance of 2.0 × 106 Ω/□ and a surface reflectivity of 0.35% (at 574 nm), which are good anti-reflection and anti-static properties for a thin film. Observation of the cross-sectional structure of the film by transmission electron microscope (TEM) reveals that the layer formed on the film is both flat and uniform.

元の言語English
ページ(範囲)87-92
ページ数6
ジャーナルJournal of Non-Crystalline Solids
332
発行部数1-3
DOI
出版物ステータスPublished - 2003 12 15

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ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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