Preparation of a stable silica using a counter diffusion chemical vapor deposition method

Mikihiro Nomura, Kenta Ono, SurajGopalakrishnan SurajGopalakrishnan, Takashi Sugawara, Shin-ichi Nakao

研究成果: Article

元の言語English
ページ(範囲)151-158
ジャーナルJournal of Membrane Science
251
出版物ステータスPublished - 2005 4 1

これを引用

Nomura, M., Ono, K., SurajGopalakrishnan, S., Sugawara, T., & Nakao, S. (2005). Preparation of a stable silica using a counter diffusion chemical vapor deposition method. Journal of Membrane Science, 251, 151-158.