Preparation of an H2-permselective silica membrane for the separation of H2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process

Odtsetseg Myagmarjav, Ayumi Ikeda, Nobuyuki Tanaka, Shinji Kubo, Mikihiro Nomura

研究成果: Article

10 引用 (Scopus)

抄録

A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.

元の言語English
ページ(範囲)6012-6023
ページ数12
ジャーナルInternational Journal of Hydrogen Energy
42
発行部数9
DOI
出版物ステータスPublished - 2017 3 2

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iodides
Silica
silicon dioxide
membranes
Decomposition
Membranes
decomposition
Hydrogen
preparation
hydrogen
Alumina
aluminum oxides
selectivity
water splitting
Chemical vapor deposition
counters
vapor deposition
tubes
Temperature
temperature

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Fuel Technology
  • Condensed Matter Physics
  • Energy Engineering and Power Technology

これを引用

Preparation of an H2-permselective silica membrane for the separation of H2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process. / Myagmarjav, Odtsetseg; Ikeda, Ayumi; Tanaka, Nobuyuki; Kubo, Shinji; Nomura, Mikihiro.

:: International Journal of Hydrogen Energy, 巻 42, 番号 9, 02.03.2017, p. 6012-6023.

研究成果: Article

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abstract = "A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.",
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AU - Myagmarjav, Odtsetseg

AU - Ikeda, Ayumi

AU - Tanaka, Nobuyuki

AU - Kubo, Shinji

AU - Nomura, Mikihiro

PY - 2017/3/2

Y1 - 2017/3/2

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AB - A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h.

KW - Chemical vapor deposition

KW - Hydrogen iodide decomposition

KW - Silica membrane

KW - Thermochemical hydrogen production

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