Preparation of Bi4Ti3O12/Bi2SiO5 /Si structures derived by metal organic decomposition technique

Masaki Yamaguchi, Takao Nagatomo, Yoichiro Masuda

研究成果: Article査読

11 被引用数 (Scopus)

抄録

Bismuth titanate (Bi4Ti3O12) thin films were fabricated on a bismuth silicate (Bi2SiO5)-coated silicon substrate by the metalorganic decomposition (MOD) method. It was confirmed that the resultant films were single-phase Bi4Ti3O12 thin films with c-axis-dominant orientation. However, the fabricated films have a high leakage current density of approximately 104 A·cm-2. It is considered that this is mainly caused by the surface roughness due to the growth of plate-like grains. The growth of the Bi4Ti3O12 thin films using the MOD method is influenced by the substrate. Therefore, it is regarded that the addition of Bi2SiO5 thin film improves the crystallinity of Bi4Ti3O12 thin films.

本文言語English
ページ(範囲)5559-5563
ページ数5
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
40
9 B
DOI
出版ステータスPublished - 2001 9

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

フィンガープリント

「Preparation of Bi<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub>/Bi<sub>2</sub>SiO<sub>5</sub> /Si structures derived by metal organic decomposition technique」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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