Preparation of five-layered Si/Si x Ge 1-x nano-films by RF helicon magnetron sputtering

S. Tanemura, L. Miao, T. Watanabe, M. Imaoka, M. Tanemura, Y. Mori

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Five-layered Si/Si x Ge 1-x films on Si(1 0 0) substrate with single-layer thickness of 30 nm, 10 nm and 5 nm, respectively were prepared by RF helicon magnetron sputtering with dual targets of Si and Ge to investigate the feasibility of an industrial fabrication method on multi-stacked superlattice structure for thin-film thermoelectric applications. The fine periodic structure is confirmed in the samples except for the case of 5 nm in single-layer thickness. Fine crystalline Si x Ge 1-x layer is obtained from 700 °C in substrate temperature, while higher than 700 °C is required for Si good layer. The composition ratio (x) in Si x Ge 1-x is varied depending on the applied power to Si and Ge targets. Typical power ratio to obtain x = 0.83 was 7:3, Hall coefficient, p-type carrier concentration, sheet carrier concentration and mobility measured for the sample composed of five layers of Si (10 nm)/Si 0.82 Ge 0.18 (10 nm) are 2.55 × 10 6 /°C, 2.56 × 10 12 cm -3 , 1.28 × 10 7 cm -2 , and 15.8 cm -2 /(V s), respectively.

本文言語English
ページ(範囲)308-311
ページ数4
ジャーナルApplied Surface Science
254
1 SPEC. ISS.
DOI
出版ステータスPublished - 2007 10月 31
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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