Preparation of Silica Membranes by CVD Method

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Amorphous silica is paid attention as a material for H 2 separation membranes because it shows diffusion selectivity of H 2 . Usually, the silica membrane is formed on a porous ceramic support in order to maintain the mechanical strength of the thin membrane. There are a sol-gel method and a chemical vapor deposition (CVD) method as a typical membrane preparation method. A silica sol is prepared by hydrolyzing a silica source such as a silicon alkoxide for the sol-gel method, and a porous ceramic substrate is coated with the solution to form a membrane. Here, we have paid attention to the CVD methods that the silica source is supplied by a vapor phase. A silica source is vaporized to deposit on a porous ceramic substrate. Silica membranes can be deposited on modules with complicated shape such as a multimembrane module because of the higher diffusivity of the vapor silica sources. The CVD method can be classified into two types, a one side geometry method and a counter-diffusion method.

元の言語English
ホスト出版物のタイトルCurrent Trends and Future Developments on (Bio-) Membranes
ホスト出版物のサブタイトルSilica Membranes: Preparation, Modelling, Application, and Commercialization
出版者Elsevier Inc.
ページ25-43
ページ数19
ISBN(電子版)9780444638670
ISBN(印刷物)9780444638663
DOI
出版物ステータスPublished - 2017 8 12

ASJC Scopus subject areas

  • Engineering(all)
  • Chemical Engineering(all)

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    Nomura, M. (2017). Preparation of Silica Membranes by CVD Method. : Current Trends and Future Developments on (Bio-) Membranes: Silica Membranes: Preparation, Modelling, Application, and Commercialization (pp. 25-43). Elsevier Inc.. https://doi.org/10.1016/B978-0-444-63866-3.00002-9