抜粋
Thin-films of Ni xZn 1-x:Fe 2O 4 [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 1783-1786 |
| ページ数 | 4 |
| ジャーナル | Physica Status Solidi (A) Applications and Materials Science |
| 巻 | 205 |
| 発行部数 | 8 |
| DOI | |
| 出版物ステータス | Published - 2008 8 1 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry
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これを引用
Koblischka, M. R., Kirsch, M., Brust, M., Koblischka-Veneva, A., & Hartmann, U. (2008). Preparation of thin ferrite films on silicon using RF sputtering. Physica Status Solidi (A) Applications and Materials Science, 205(8), 1783-1786. https://doi.org/10.1002/pssa.200723608