TY - JOUR
T1 - Preparation of thin ferrite films on silicon using RF sputtering
AU - Koblischka, M. R.
AU - Kirsch, M.
AU - Brust, M.
AU - Koblischka-Veneva, A.
AU - Hartmann, U.
PY - 2008/8
Y1 - 2008/8
N2 - Thin-films of Ni xZn 1-x:Fe 2O 4 [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.
AB - Thin-films of Ni xZn 1-x:Fe 2O 4 [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.
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U2 - 10.1002/pssa.200723608
DO - 10.1002/pssa.200723608
M3 - Article
AN - SCOPUS:54249163647
VL - 205
SP - 1783
EP - 1786
JO - Physica Status Solidi (A) Applications and Materials Science
JF - Physica Status Solidi (A) Applications and Materials Science
SN - 1862-6300
IS - 8
ER -