Preparation of thin ferrite films on silicon using RF sputtering

M. R. Koblischka; M. Kirsch; M. Brust; A. Koblischka-Veneva; U. Hartmann

doi:10.1002/pssa.200723608

Preparation of thin ferrite films on silicon using RF sputtering

M. R. Koblischka, M. Kirsch, M. Brust, A. Koblischka-Veneva, U. Hartmann

研究成果: Article › 査読

6 被引用数 (Scopus)

抄録

Thin-films of Ni _xZn _1-x:Fe ₂O ₄ [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.

本文言語	English
ページ（範囲）	1783-1786
ページ数	4
ジャーナル	Physica Status Solidi (A) Applications and Materials Science
巻	205
号	8
DOI	https://doi.org/10.1002/pssa.200723608
出版ステータス	Published - 2008 8 1
外部発表	はい

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

文献へのアクセス

10.1002/pssa.200723608

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引用スタイル

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