Preparation of thin ferrite films on silicon using RF sputtering

M. R. Koblischka, M. Kirsch, M. Brust, A. Koblischka-Veneva, U. Hartmann

研究成果: Article

6 引用 (Scopus)

抜粋

Thin-films of Ni xZn 1-x:Fe 2O 4 [(Ni,Zn)-ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We Find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The inicrostructure of the films is investigated employing transmission electron microscopy, electron baclcscatter diffraction and magnetic force microscopy.

元の言語English
ページ(範囲)1783-1786
ページ数4
ジャーナルPhysica Status Solidi (A) Applications and Materials Science
205
発行部数8
DOI
出版物ステータスPublished - 2008 8 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

フィンガープリント Preparation of thin ferrite films on silicon using RF sputtering' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用