Properties of a thin-film optical waveguide using fluorinated silicon oxide and organic spin-on-glass films

Tetsuya Homma, Hiroyasu Kondo, Masaya Sakamoto, Masahiro Nomoto, Kazuaki Inohara, Yuji Ariyama, Masahiro Itoh, Hideo Takahashi

研究成果: Article査読

4 被引用数 (Scopus)

抄録

A thin-film optical waveguide using a fluorinated silicon oxide (SiOF) as a core layer was investigated. An organic spin-on-glass (SOG) film was used for a cladding layer. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. A thin-film optical waveguide structure for single mode was designed and fabricated, based on the dispersion properties of refractive indices for the LPD-SiOF and organic SOG films. The refractive indices at a wavelength of 632.8 nm were 1.430 and around 1.400 for the LPD-SiOF and organic SOG films, respectively. The thickness of LPD-SiOF films deposited was 1.18 μm. Thicknesses of cladding organic SOG films cured at 300 and 400°C were 1.28 and 1.31 μm, respectively. The effective refractive indices for single mode were 1.4169 and 1.4158 at a wavelength of 632.8 nm for the cladding organic SOG films cured at 300 and 400°C, respectively, and differences between the measured and calculated incident angles were 0.84° and 1.29° for the cladding organic SOG films cured at these respective temperatures. A streak of guidedlight was observed for the LPD-SiOF/SOG structure optical waveguide. The transmission loss was 7.6-7.9 dB/cm.

本文言語English
ページ(範囲)505-510
ページ数6
ジャーナルOptical Review
7
6
DOI
出版ステータスPublished - 2000 1 1

ASJC Scopus subject areas

  • 原子分子物理学および光学

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