TY - JOUR
T1 - Proximity effect in electron-beam-induced deposition
AU - Mitsuishi, Kazutaka
AU - Shimojo, Masayuki
AU - Takeguchi, Masaki
AU - Tanaka, Miyoko
AU - Furuya, Kazuo
PY - 2006/6/20
Y1 - 2006/6/20
N2 - We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.
AB - We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.
KW - CVD
KW - Electron-beam-induced deposition
KW - Nanofabrication
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U2 - 10.1143/JJAP.45.5517
DO - 10.1143/JJAP.45.5517
M3 - Review article
AN - SCOPUS:33745647869
VL - 45
SP - 5517
EP - 5521
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 6 B
ER -