Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Hiroyuki Oguchi, Shigehito Isobe, Hiroki Kuwano, Susumu Shiraki, Shin Ichi Orimo, Taro Hitosugi

研究成果: Article査読

10 被引用数 (Scopus)

抄録

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.

本文言語English
論文番号096106
ジャーナルAPL Materials
3
9
DOI
出版ステータスPublished - 2015 9月 1
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 工学(全般)

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