抄録
We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.
本文言語 | English |
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論文番号 | 096106 |
ジャーナル | APL Materials |
巻 | 3 |
号 | 9 |
DOI | |
出版ステータス | Published - 2015 9月 1 |
外部発表 | はい |
ASJC Scopus subject areas
- 材料科学(全般)
- 工学(全般)