TY - JOUR
T1 - Radial distribution of temperature gradients in growing CZ-Si crystals and its application to the prediction of microdefect distribution
AU - Kitamura, K.
AU - Furukawa, J.
AU - Nakada, Y.
AU - Ono, N.
AU - Shimanuki, Y.
AU - Eidenzon, A. M.
AU - Puzanov, N. I.
AU - Puzanov, D. N.
PY - 2002/7
Y1 - 2002/7
N2 - Experiments were performed to estimate the adequacy of simulation results obtained using global analysis of heat transfer performed using melt convection models. First, we reproduced the shapes of the crystal-melt interface for several crystal lengths using two turbulence models with standard value of the Karman constant. Moreover, axial temperature distributions were measured by imbedding thermocouples into the crystal as it grew from the silicon melt. During the experiment, the crystal and the crucible were rotated to match the simulation conditions. Temperatures were measured at three points located at different distances from the crystal axis. Comparing these results with the simulation results, we found that the distribution predicted by the k-l turbulence model was more realistic and agreed well with the results of the experiments. Finally, computer simulation, based on the parallel model of the void and oxide precipitate formation in silicon crystals is reported. The unusual microdefect pattern observed in the silicon crystal with a diameter of 150 mm, where oxide particles occured in the interstitial-rich region was reproduced by the simulation and explained.
AB - Experiments were performed to estimate the adequacy of simulation results obtained using global analysis of heat transfer performed using melt convection models. First, we reproduced the shapes of the crystal-melt interface for several crystal lengths using two turbulence models with standard value of the Karman constant. Moreover, axial temperature distributions were measured by imbedding thermocouples into the crystal as it grew from the silicon melt. During the experiment, the crystal and the crucible were rotated to match the simulation conditions. Temperatures were measured at three points located at different distances from the crystal axis. Comparing these results with the simulation results, we found that the distribution predicted by the k-l turbulence model was more realistic and agreed well with the results of the experiments. Finally, computer simulation, based on the parallel model of the void and oxide precipitate formation in silicon crystals is reported. The unusual microdefect pattern observed in the silicon crystal with a diameter of 150 mm, where oxide particles occured in the interstitial-rich region was reproduced by the simulation and explained.
KW - A1. Diffusion
KW - A1. Nucleation
KW - A1. Point defects
KW - A2. Czochralski method
KW - A2. Growth from melt
KW - A2. Single crystal growth
KW - B2. Semiconducting silicon
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U2 - 10.1016/S0022-0248(02)01389-1
DO - 10.1016/S0022-0248(02)01389-1
M3 - Article
AN - SCOPUS:0036645554
VL - 242
SP - 293
EP - 301
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
IS - 3-4
ER -