Reaction temperature and time dependence of MoCl5 intercalation to few-layer graphene

Ekkaphop Ketsombun, Xiangyu Wu, Inge Asselberghs, Swati Achra, Cedric Huyghebaert, Dennis Lin, Zsolt Tokei, Kazuyoshi Ueno

研究成果: Article

抜粋

The efficient MoCl5 intercalation process is required to reduce the resistance of graphene interconnects. We found that optimum intercalation temperature and time depends on the layer number of few-layer graphene. The bilayer graphene was intercalated at 175 °C without serious damage, besides that higher temperature of 200 °C was required to intercalate tri-layer graphene (TLG) with a fixed reaction time for 60 min. Although we can reduce the intercalation temperature for TLG, longer reaction time is required and higher damage is found. After considering both viewpoint of the effective doping and low damage, the high reaction temperature with short reaction time condition may be suitable for the TLG intercalation process. The stacked upper layer is considered to protect the underlying layer from chemical damage during the intercalation process and it leads to the higher activation energy for intercalation at the same time. Therefore, higher reaction temperature or longer reaction time are required for intercalating FLG with more layer numbers.

元の言語English
記事番号SLLE01
ジャーナルJapanese Journal of Applied Physics
59
発行部数SL
DOI
出版物ステータスPublished - 2020 7 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Ketsombun, E., Wu, X., Asselberghs, I., Achra, S., Huyghebaert, C., Lin, D., Tokei, Z., & Ueno, K. (2020). Reaction temperature and time dependence of MoCl5 intercalation to few-layer graphene. Japanese Journal of Applied Physics, 59(SL), [SLLE01]. https://doi.org/10.35848/1347-4065/ab7e3c