本文言語 | English |
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ページ(範囲) | 21-30 |
ジャーナル | Memoirs of Faculty of Engineering |
出版ステータス | Published - 1997 1月 1 |
Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing
F. Tochikubo, T. Watanabe, H. Nishikawa, E. Watanabe, D. Ito, T. Okumura, H. Kaibe
研究成果: Article › 査読