Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

F. Tochikubo, T. Watanabe, H. Nishikawa, E. Watanabe, D. Ito, T. Okumura, H. Kaibe

研究成果: Article査読

本文言語English
ページ(範囲)21-30
ジャーナルMemoirs of Faculty of Engineering
出版ステータスPublished - 1997 1 1

引用スタイル