Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

F. Tochikubo, T. Watanabe, H. Nishikawa, E. Watanabe, D. Ito, T. Okumura, H. Kaibe

研究成果: Article › 査読

本文言語	English
ページ（範囲）	21-30
ジャーナル	Memoirs of Faculty of Engineering
出版ステータス	Published - 1997 1月 1

引用スタイル

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title = "Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing",

author = "F. Tochikubo and T. Watanabe and H. Nishikawa and E. Watanabe and D. Ito and T. Okumura and H. Kaibe",

year = "1997",

month = jan,

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language = "English",

pages = "21--30",

journal = "Memoirs of Faculty of Engineering",

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TY - JOUR

T1 - Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

AU - Tochikubo, F.

AU - Watanabe, T.

AU - Nishikawa, H.

AU - Watanabe, E.

AU - Ito, D.

AU - Okumura, T.

AU - Kaibe, H.

PY - 1997/1/1

Y1 - 1997/1/1

M3 - Article

SP - 21

EP - 30

JO - Memoirs of Faculty of Engineering

JF - Memoirs of Faculty of Engineering

ER -