Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation

Satoshi Fukui, Kyosuke Kazama, Syouta Sekiya, Jun Ogawa, Tetsuo Oka, Takao Sato, Satoshi Sorimachi, Kimiyo Saito, Shinsuke Miyazaki

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.

本文言語English
論文番号5433322
ページ(範囲)977-980
ページ数4
ジャーナルIEEE Transactions on Applied Superconductivity
20
3
DOI
出版ステータスPublished - 2010 6 1
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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