Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.
ASJC Scopus subject areas