Resolution in nanofabrication by electron-beam induced deposition combined with low energy ion milling

K. Mitsuishi, M. Shimojo, M. Tanaka, M. Takeguchi, K. Furuya

研究成果: Conference contribution

抜粋

A nanofabrication technique combining electron beam induced deposition (EBID) and low energy ion milling was demonstrated. A nanosized deposit fabricated by EBID forms a mask for successive low energy ion millings, so that the substrate region covered with the nanodeposit forms a nanostructure. Using a desired material as the substrate allows the production of any material by this method. The lateral size obtained was similar to the lateral size of the deposited mask which means that the size obtainable by the method is almost the same as the size of the deposit produced by EBID.

元の言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2004
ページ118-119
ページ数2
出版物ステータスPublished - 2004 12 1
イベント2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
継続期間: 2004 10 262004 10 29

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
Japan
Osaka
期間04/10/2604/10/29

    フィンガープリント

ASJC Scopus subject areas

  • Engineering(all)

これを引用

Mitsuishi, K., Shimojo, M., Tanaka, M., Takeguchi, M., & Furuya, K. (2004). Resolution in nanofabrication by electron-beam induced deposition combined with low energy ion milling. : Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 118-119). (Digest of Papers - Microprocesses and Nanotechnology 2004).