Resolution in new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling

Kazutaka Mitsuishi, Masayuki Shimojo, Miyoko Tanaka, Masaki Takeguchi, Kazuo Furuya

研究成果: Article査読

7 被引用数 (Scopus)

抄録

A new nanofabrication technique in which the deposits fabricated by electron-beam-induced deposition (EBID) are used as masks for low-energy ion milling was performed with various masks deposited at different deposition times, and the shape changes of the W mask and GaAs substrates caused by ion milling were observed. From these results, the time evolution of the shape change of the fabricated structures was studied, and the resolution dependence of the structure to the mask size was determined. The W mask showed a lower etch rate, proving its effectiveness as a mask for ion milling. Nanostructures less than 10 nm in diameter can be fabricated by this method.

本文言語English
ページ(範囲)5627-5630
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
44
7 B
DOI
出版ステータスPublished - 2005 7 26
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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