Review of development and performance evaluation of active-matrix nanocrystalline Si electron emitter array for massively parallel electron beam direct-write lithography

Naokatsu Ikegami, Akira Kojima, Hiroshi Miyaguchi, Takashi Yoshida, Shinya Yoshida, Masanori Muroyama, Masanori Sugata, Nobuyoshi Koshida, Kentaro Totsu, Masayoshi Esashi

研究成果: Review article査読

抄録

This paper reviews our recent progress of application studies on planer-surface-type and Pierce-gun-type nanocrystalline silicon (nc-Si) ballistic electron emitter arrays, which were designed and prototyped to be able to integrate with a separately fabricated active-matrix large scale integrated driving circuit for the realization of massively parallel electron beam (EB) direct-write lithography. The unit enables all the pixels to be simultaneously driven in accordance with a bitmap image stored in a built-in memory and the beamlets to be switched on and off by operating the CMOS compatible voltage. Discussion in this paper will be focused on the process design and performance evaluations of the prototype nc-Si electron emitter arrays, which include electron emission and 1:1 pattern transfer characteristics. In addition, our currently addressing preliminary assessment of the 1:1 EB projection test, made using a test bench by externally LSI-driving the planer-surface-type emitter array, will be introduced.

本文言語English
ページ(範囲)221-229
ページ数9
ジャーナルIEEJ Transactions on Sensors and Micromachines
135
6
DOI
出版ステータスPublished - 2015 6月 1
外部発表はい

ASJC Scopus subject areas

  • 機械工学
  • 電子工学および電気工学

フィンガープリント

「Review of development and performance evaluation of active-matrix nanocrystalline Si electron emitter array for massively parallel electron beam direct-write lithography」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル