Silica-based ro membranes for separation of acidic solution

Katsunori Ishii, Ayumi Ikeda, Toshichika Takeuchi, Junko Yoshiura, Mikihiro Nomura

研究成果: Article

抄録

The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81% with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % H2SO4 solution.

元の言語English
記事番号94
ジャーナルMembranes
9
発行部数8
DOI
出版物ステータスPublished - 2019 8 1

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Silicon Dioxide
Silica
Membranes
Substrates
Acids
Aluminum Oxide
Permeation
Alumina
Fluxes
Osmosis membranes
Reverse osmosis
Sulfuric acid
Chemical vapor deposition
Gases
diphenyldimethoxysilane

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Process Chemistry and Technology
  • Filtration and Separation

これを引用

Silica-based ro membranes for separation of acidic solution. / Ishii, Katsunori; Ikeda, Ayumi; Takeuchi, Toshichika; Yoshiura, Junko; Nomura, Mikihiro.

:: Membranes, 巻 9, 番号 8, 94, 01.08.2019.

研究成果: Article

Ishii, Katsunori ; Ikeda, Ayumi ; Takeuchi, Toshichika ; Yoshiura, Junko ; Nomura, Mikihiro. / Silica-based ro membranes for separation of acidic solution. :: Membranes. 2019 ; 巻 9, 番号 8.
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abstract = "The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81{\%} with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11{\%} with the acid treatment through the silica substrate, while the permeance decreased to 94{\%} through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt {\%} H2SO4 solution.",
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KW - Silica substrate

KW - Sol-gel method

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