Simple removal technology using ozone solution for chemically-stable polymer used for MEMS

H. Yanagida, S. Yoshida, M. Esashi, S. Tanaka

研究成果: Conference contribution

6 被引用数 (Scopus)

抄録

This paper reports simple removal technology using ozone solution for chemically-stable polymers such as SU-8, BCB, polyimide and carbonized resist. Conventionally, these polymers are difficult to remove completely by O2 plasma and organic solutions because of their chemical stability and inorganic additives. In this study, these polymers were etched using acetic acid and water solution of ozone. Residue analysis after polymer etching was performed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The analysis demonstrated that the ozone solution could etch and remove these polymers without residue. This strong etching effect might be attributed to strong organic decomposition ability of ozone and rinse effect of inorganic materials in wet process.

本文言語English
ホスト出版物のタイトル2011 IEEE 24th International Conference on Micro Electro Mechanical Systems, MEMS 2011
ページ324-327
ページ数4
DOI
出版ステータスPublished - 2011
外部発表はい
イベント24th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2011 - Cancun, Mexico
継続期間: 2011 1月 232011 1月 27

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN(印刷版)1084-6999

Conference

Conference24th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2011
国/地域Mexico
CityCancun
Period11/1/2311/1/27

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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