Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Y. Shiine, H. Nishikawa, Y. Furuta, K. Kanamitsu, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.

本文言語English
ページ(範囲)835-838
ページ数4
ジャーナルMicroelectronic Engineering
87
5-8
DOI
出版ステータスPublished - 2010 5

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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