Sputter-Deposited Si layer for optical isolator with si guiding layer

Hideki Yokoi, Keigo Sasaki, Takayoshi Aiba

研究成果: Article

10 引用 (Scopus)

抄録

An optical isolator with a Si guiding layer that makes use of a nonreciprocal phase shift is discussed. The Si guiding layer was sputterdeposited on a garnet substrate. The magnetooptic waveguide in the optical isolator had an air/Si/magnetic garnet structure. The Si layer deposited on the garnet substrate was analyzed by spectroscopic ellipsometry and X-ray diffraction. A rib waveguide was fabricated on the deposited Si layer and evaluated. The nonreciprocal phase shift in the magnetooptic waveguide was calculated at a wavelength of 1.55 mm. The required thickness of the magnetic-garnet cladding layer was obtained by calculating the nonreciprocal phase shift.

元の言語English
記事番号062202
ジャーナルJapanese Journal of Applied Physics
48
発行部数6
DOI
出版物ステータスPublished - 2009 6

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isolators
Garnets
garnets
Phase shift
Magnetooptical effects
Waveguides
phase shift
waveguides
Spectroscopic ellipsometry
Substrates
ellipsometry
X ray diffraction
Wavelength
Air
air
diffraction
wavelengths
x rays

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Sputter-Deposited Si layer for optical isolator with si guiding layer. / Yokoi, Hideki; Sasaki, Keigo; Aiba, Takayoshi.

:: Japanese Journal of Applied Physics, 巻 48, 番号 6, 062202, 06.2009.

研究成果: Article

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