Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures

K. Kyuno, K. Kita, A. Toriumi

研究成果: Article › 査読

本文言語	English
ページ（範囲）	788-789
ジャーナル	Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
出版ステータス	Published - 2004 9月 1

引用スタイル

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title = "Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures",

author = "K. Kyuno and K. Kita and A. Toriumi",

year = "2004",

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language = "English",

pages = "788--789",

journal = "Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)",

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T1 - Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures

AU - Kyuno, K.

AU - Kita, K.

AU - Toriumi, A.

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Y1 - 2004/9/1

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EP - 789

JO - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

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