Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition

Mikihiro Nomura; Hitoshi Aida; Suraj Gopalakarishnan; TakashiSugawara TakashiSugawara; Shin-ichi Nakao; Satoshi Yamazaki; Takeshi Inada; Yuji Iwamoto

Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakarishnan, TakashiSugawara TakashiSugawara, Shin-ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

地域環境システム専攻

研究成果: Article › 査読

本文言語	English
ページ（範囲）	1-7
ジャーナル	Desalination
巻	193
出版ステータス	Published - 2006 5月 10

引用スタイル

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title = "Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition",

author = "Mikihiro Nomura and Hitoshi Aida and Suraj Gopalakarishnan and TakashiSugawara TakashiSugawara and Shin-ichi Nakao and Satoshi Yamazaki and Takeshi Inada and Yuji Iwamoto",

year = "2006",

month = may,

day = "10",

language = "English",

volume = "193",

pages = "1--7",

journal = "Desalination",

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T1 - Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition

AU - Nomura, Mikihiro

AU - Aida, Hitoshi

AU - Gopalakarishnan, Suraj

AU - TakashiSugawara, TakashiSugawara

AU - Nakao, Shin-ichi

AU - Yamazaki, Satoshi

AU - Inada, Takeshi

AU - Iwamoto, Yuji

PY - 2006/5/10

Y1 - 2006/5/10

M3 - Article

VL - 193

SP - 1

EP - 7

JO - Desalination

JF - Desalination

SN - 0011-9164

ER -