抄録
A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.
本文言語 | English |
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ページ(範囲) | 1-7 |
ページ数 | 7 |
ジャーナル | Desalination |
巻 | 193 |
号 | 1-3 |
DOI | |
出版ステータス | Published - 2006 5月 10 |
外部発表 | はい |
ASJC Scopus subject areas
- 化学 (全般)
- 化学工学(全般)
- 材料科学(全般)
- 水の科学と技術
- 機械工学