Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakrishnan, Takashi Sugawara, Shin ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

研究成果: Article査読

47 被引用数 (Scopus)

抄録

A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

本文言語English
ページ(範囲)1-7
ページ数7
ジャーナルDesalination
193
1-3
DOI
出版ステータスPublished - 2006 5月 10
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)
  • 材料科学(全般)
  • 水の科学と技術
  • 機械工学

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