Surface amorphization in Zr alloy films via Ni implantation

Shinji Muraishi, Hirono Naito, Tatuhiko Aizawa

研究成果: Conference contribution

抜粋

Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

元の言語English
ホスト出版物のタイトルSurfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine
ページ23-27
ページ数5
出版物ステータスPublished - 2006 12 1
イベント135th TMS Annual Meeting, 2006 - San Antonio, TX, United States
継続期間: 2006 3 122006 3 16

出版物シリーズ

名前TMS Annual Meeting
2006

Conference

Conference135th TMS Annual Meeting, 2006
United States
San Antonio, TX
期間06/3/1206/3/16

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys

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  • これを引用

    Muraishi, S., Naito, H., & Aizawa, T. (2006). Surface amorphization in Zr alloy films via Ni implantation. : Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine (pp. 23-27). (TMS Annual Meeting; 巻数 2006).