The microscopic mechanism of surfactant epitaxy by molecular dynamics

K. Mae, K. Kyuno, R. Yamamoto

研究成果: Article査読

15 被引用数 (Scopus)

抄録

Surfactant epitaxy has been expected to be a powerful method to improve thin-film growth from 3D island to layered growth, but the atomic level process of surfactant epitaxy has not been revealed yet. The purpose of this paper is to elucidate the phenomenon of surfactant epitaxy by molecular dynamic simulations. It is found that a smaller surface energy is necessary for the surfactant to be stable on the surface and that the difference of the atomic radii between the surfactant and the adatom plays an important role in the process of quick exchange of their positions.

本文言語English
ページ(範囲)73-85
ページ数13
ジャーナルModelling and Simulation in Materials Science and Engineering
4
1
DOI
出版ステータスPublished - 1996 1

ASJC Scopus subject areas

  • Modelling and Simulation
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Computer Science Applications

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