A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10-6/°C, -60 × 10-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.
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