Thickness-dependent structural and optical properties of VO2 thin films

Jianwei Ma, Gang Xu, Lei Miao, Masato Tazawa, Sakae Tanemura

研究成果: Article査読

21 被引用数 (Scopus)

抄録

VO2 thin films with thicknesses from 100 to 2 nm were prepared on C-plane sapphire (0001) substrates by magnetron sputtering and remarkable thickness-dependent structural and optical properties were found. Below 10 nm, the films are nonconductive, island structured, and their phase transition temperatures are reduced to be much lower than those of the continuous, thick films. Structural defects in the island crystal films may be one of the main reasons for this temperature reduction. The film growth mode was identified to be the Vollmer-Weber (island growth)-type in the initial stage.

本文言語English
論文番号020215
ジャーナルJapanese Journal of Applied Physics
50
2
DOI
出版ステータスPublished - 2011 2
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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