Three-dimensional micro modification and selective etching of crystalline silicon using 1.56-μm subpicosecond laser pulses

Shigeki Matsuo, Keiji Oda, Yoshiki Naoi

研究成果: Conference contribution

抄録

Three dimensional micro removal processing was attempted to crystalline silicon substrate using a 1.56-μm subpicosecond laser. Selective removal was observed on both top and rear surfaces when nitric hydrofluoric acid was used as etchant.

元の言語English
ホスト出版物のタイトルPacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
DOI
出版物ステータスPublished - 2013
外部発表Yes
イベント10th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2013 - Kyoto
継続期間: 2013 6 302013 7 4

Other

Other10th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2013
Kyoto
期間13/6/3013/7/4

Fingerprint

Silicon
Etching
Laser pulses
etching
Hydrofluoric Acid
Crystalline materials
Hydrofluoric acid
etchants
hydrofluoric acid
nitric acid
silicon
Nitric acid
pulses
lasers
Lasers
Substrates
Processing

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

これを引用

Matsuo, S., Oda, K., & Naoi, Y. (2013). Three-dimensional micro modification and selective etching of crystalline silicon using 1.56-μm subpicosecond laser pulses. : Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest [6600555] https://doi.org/10.1109/CLEOPR.2013.6600555

Three-dimensional micro modification and selective etching of crystalline silicon using 1.56-μm subpicosecond laser pulses. / Matsuo, Shigeki; Oda, Keiji; Naoi, Yoshiki.

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest. 2013. 6600555.

研究成果: Conference contribution

Matsuo, S, Oda, K & Naoi, Y 2013, Three-dimensional micro modification and selective etching of crystalline silicon using 1.56-μm subpicosecond laser pulses. : Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest., 6600555, 10th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2013, Kyoto, 13/6/30. https://doi.org/10.1109/CLEOPR.2013.6600555
Matsuo, Shigeki ; Oda, Keiji ; Naoi, Yoshiki. / Three-dimensional micro modification and selective etching of crystalline silicon using 1.56-μm subpicosecond laser pulses. Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest. 2013.
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