Three-dimensional residue-free volume removal inside sapphire by high-temperature etching after irradiation of femtosecond laser Pulses

Shigeki Matsuo, Kensuke Tokumi, Takuro Tomita, Shuichi Hashimoto

研究成果: Article査読

9 被引用数 (Scopus)

抄録

We applied the femtosecond laser-assisted etching technique, that is, irradiation of focused femtosecond laser pulses followed by selective chemical etching, to volume removal inside sapphire. At room temperature, volume etching only slightly advanced while residue remained inside the volume. By increasing the etching temperature, complete volume etching without residue was achieved. Complete etching was, however, accompanied by undesirable phenomena of surface pits or cracks, which are expected to be excluded through further improvement of processing.

本文言語English
論文番号892721
ジャーナルLaser Chemistry
2008
DOI
出版ステータスPublished - 2008
外部発表はい

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Biochemistry
  • Spectroscopy

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