Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Takanori Sakamoto; Shiro Shimada; Hajime Kiyono; Jiro Tsujino; Isao Yamazaki

doi:10.1016/j.mseb.2010.05.010

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Takanori Sakamoto, Shiro Shimada, Hajime Kiyono, Jiro Tsujino, Isao Yamazaki

研究成果: Article › 査読

3 被引用数 (Scopus)

抄録

Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H₂O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H₂O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H₂O supply is more adhesive than under constant H₂O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al₂O₃ coating by thermal CVD.

本文言語	English
ページ（範囲）	201-206
ページ数	6
ジャーナル	Materials Science and Engineering B: Solid-State Materials for Advanced Technology
巻	172
号	2
DOI	https://doi.org/10.1016/j.mseb.2010.05.010
出版ステータス	Published - 2010 8月 25
外部発表	はい

ASJC Scopus subject areas

材料科学（全般）
凝縮系物理学
材料力学
機械工学

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10.1016/j.mseb.2010.05.010

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引用スタイル

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates. / Sakamoto, Takanori; Shimada, Shiro; Kiyono, Hajime; Tsujino, Jiro; Yamazaki, Isao.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 172, No. 2, 25.08.2010, p. 201-206.

研究成果: Article › 査読

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title = "Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates",

abstract = "Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.",

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author = "Takanori Sakamoto and Shiro Shimada and Hajime Kiyono and Jiro Tsujino and Isao Yamazaki",

note = "Funding Information: We wish express our heartfelt gratitude to Prof. K.J.D. MacKenzie, Victoria University of Wellington, N.Z. for his kind reviewing our manuscript. A part of this study was supported by financial support of a Grant-in-Aid for Science Research (no. 18360307 ) from the Ministry of Education, Science and Culture of Japan .",

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AU - Tsujino, Jiro

AU - Yamazaki, Isao

N1 - Funding Information: We wish express our heartfelt gratitude to Prof. K.J.D. MacKenzie, Victoria University of Wellington, N.Z. for his kind reviewing our manuscript. A part of this study was supported by financial support of a Grant-in-Aid for Science Research (no. 18360307 ) from the Ministry of Education, Science and Culture of Japan .

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N2 - Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.

AB - Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.

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